A New Stability Test for Passivated NiCr Thin Film Resistors
نویسندگان
چکیده
منابع مشابه
Improved stability of thin-film resistors
Earlier, deeper investigations into the drift behavior of thin-film resistors have shown that the usual methods for predicting drift are incapable of describing the present remarkable differences within a certain R-layer alloy system (for example, CrNi) or those between different alloy systems (for example, CrNi versus CrSi or TaN). In order to come to a more precise model, we have to ignore al...
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In this study, commercial-grade NiCr (80 wt % Ni, 20 wt % Cr) and NiCrSi (55 wt % Ni, 40 wt % Cr, 5 wt % Si) were used as targets and the sputtering method was used to deposit NiCr and NiCrSi thin films on Al₂O₃ and Si substrates at room temperature under different deposition time. X-ray diffraction patterns showed that the NiCr and NiCrSi thin films were amorphous phase, and the field-effect s...
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ژورنال
عنوان ژورنال: Active and Passive Electronic Components
سال: 1989
ISSN: 0882-7516,1563-5031
DOI: 10.1155/1989/90823